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CCD camera - pco.ultraviolet

CCD SCIENTIFIC CAMERA - pco.ultraviolet

Based on special CCD technology the pco.ultraviolet provides highest sensitivity in the UV range of the spectrum and a dynamic range of 14 bit. Exposure times can be adjusted from micro seconds up to one minute by software.

This ultra-compact camera is perfectly suited for all kinds of scientific and industrial imaging applications to which UV detection is an essential requirement. These include, inter alia, semiconductor mask inspection, discharge processes in high-voltage technology and combustion analysis.

Key advantages of pco.ultraviolet camera:

- Quantum efficiency up to 40 % @ 193 nm
- Ultra compact design
- Dimensions: 80 x 50 x 50 mm
- Readout noise typ. 8 e- rms
- 14 bit dynamic range
- High resolution 1392 x 1040 pixel
- Exposure times from 1 µs - 60 s
- Temperature compensated
- USB 2.0

El siguiente cuadro le ayudará a seleccionar la cámara UV  más adecuada a su necesidad de alta respuesta en el ultravioleta

 pco.ultravioletpco.panda 4.2 bi UVpco.edge 4.2 bi UV
SensorCCDsCMOS, back illuminatedsCMOS, back illuminated
Resolution1392 x 10402048 x 20482048 x 2048
Pixel size4.65 x 4.65 um6.5 x 6x5 um6.5 x 6x5 um
Frame rate (full frame)7.3 fps40 fps40 fps
Exposure time1 us - 60 s10 us - 500 ms10 us - 20 s
ShutterGlobalRollingRolling
QE> 40% @193nm (max 40% @vis)~55% @240nm (max 90% @vis)~60% @240nm (max 88% @vis)
Read noise7-9 e- rms1.8/1.9 e- rms1.8/1.9 e- rms
Dark current2 e-/px/s @25ºC42 e-/px/s @ 21ºC0.2 e-/px/s @25ºC
CoolingUncooledPassiveFan + water
InterfaceUSB2.0USB3.1USB3.1

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CCD camera - pco.ultraviolet

CCD camera - pco.ultraviolet

Based on special CCD technology, the pco.ultraviolet provides highest sensitivity in the UV range and a dynamic range of 14 bit. Exposure times can be adjusted from micro seconds up to one minute by software.

This ultra-compact camera is perfectly suited for all kinds of scientific and industrial imaging applications to which UV detection is an essential requirement. These include, inter alia, semiconductor mask inspection, discharge processes in high-voltage technology and combustion analysis.

Escribe tu opinión

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